High-Frequency Conductor with Improved Conductivity and Method of Its Manufacture

Publication: DE102013006624B3
Published: 2014-05-28
Family Size: 11
Granted: Yes (6/11)

Simple SummaryContent extracted from patent full text and abstract with AI.

This patent discloses a high-frequency conductor (such as those used in electronics) with improved electrical conductivity. By segmenting the conductive base material, introducing specific surface structures or internal porosity, the invention increases the proportion of the material that actually carries current at high frequencies—counteracting the 'skin effect' where current only flows near the surface. The approach enables greater efficiency in the use of expensive conductive materials like gold or other precious metals, thus achieving better performance at lower material cost. The patent also details manufacturing methods that involve layering and etching to create these structures.

Use CasesContent extracted from patent full text and abstract with AI.

  • High-frequency signal transmission lines in RF and microwave circuits
  • Gate electrodes for high-speed field-effect transistors (FETs)
  • Collector or drain electrodes in photodetectors, especially in MSM (metal-semiconductor-metal) photodetectors
  • Interconnects in integrated semiconductor devices and microchips, particularly where high-frequency or fast switching is needed
  • Advanced antenna feeds and connectors for telecommunications equipment
  • Precision measurement equipment operating at GHz or THz frequencies

BenefitsContent extracted from patent full text and abstract with AI.

  • Significantly improves electrical conductivity at high frequencies by addressing the skin effect, increasing the effective surface area for current flow.
  • Reduces the quantity of expensive conductive materials needed, thus lowering material costs and enabling the use of precious metals more economically.
  • Enables higher switching speeds and operation at higher frequencies in transistors and other semiconductor devices.
  • Can be manufactured using established thin-film deposition and etching processes, facilitating integration with standard semiconductor manufacturing workflows.
  • Provides improved performance for high-frequency electronic and optoelectronic devices such as transistors and photodetectors.
  • Allows for design flexibility through adjustment of segment sizes, surface topology, or porosity to optimize for different frequency ranges or device requirements.

Technical Classifications (CPCs)

Main Classifications

Electrical & Electronic Tech

Sub Classifications

Electric Elements

Semiconductor & Solid-State Devices

CPC Codes

H01L21/283H01L21/28587H01L21/3213H10D30/061H10D30/475H10D30/4755H10D30/6738H10D30/675H10D30/87H10D44/40H10D62/85H10D64/112H10D64/411H10D64/517H10D64/518H10D64/62H10D64/64H10D64/667H10F77/20H10F77/206

Inventors & Applicants

Applicants

Forschungszentrum Juelich Gmbh

Patent Abstract

The invention relates to a high-frequency conductor with improved conductivity. The conductor includes at least one electrically conductive base material. According to the invention, the ratio of the outer and inner surfaces of the base material through which a current can flow, is increased by a) dividing the base material perpendicular to the direction of current into at least two segments which are separated by an electrically conductive spacer and are electrically and mechanically interconnected, and/or b) topographical structures in or on the surface of the base material, and/or c) an inner porosity of at least one part of the base material compared to a shaping of the base material in which the respective feature has been omitted. It has been recognised that, by means of these measures relating to shaping, the same quantity of base material can be spatially arranged such that a larger proportion of the base material is located at a distance of at most the skin depth of an outer or inner surface, and thus is part of the flow of current. Thus a smaller amount remains unused on the basis of the skin effect.

Key Information

Publication No.

DE102013006624B3

Family ID

50478638

Publication Date

2014-05-28

Application No.

DE102013006624A

Application Date

2013-04-18

Priority Date

2013-04-18

Granted

Yes (6/11)

Possible Cooperation

For further information please contact the transfer office.