Method for Determining Surface Properties of Targets

Simple SummaryContent extracted from patent full text and abstract with AI.

This invention presents a method and device for real-time (in situ) measurement of the surface properties of conductive targets, particularly metal surfaces, within a plasma environment. The technique simultaneously determines how hydrogen or deuterium atoms and light (photons) are reflected from the surface by measuring the energy, angle, and Doppler shifts of certain spectral lines. This allows direct measurement of the surface’s reflective qualities and even determination of the mass of surface atoms without removing the target from its operational setting.

Use CasesContent extracted from patent full text and abstract with AI.

• Monitoring and quality control of optical components (such as mirrors) during semiconductor manufacturing (e.g., EUV lithography)
• Surface analysis and process optimization in plasma-based coating or cleaning systems
• Studying and tracking the condition of materials in fusion reactors or other harsh environments (including radioactive or toxic settings where sample removal is problematic)
• Research in surface physics of metals exposed to plasma (e.g. for material science purposes)
• Real-time diagnostics in plasma processing equipment for medical devices or microelectronics
• Non-destructive inspection and testing of highly reflective metallic surfaces

BenefitsContent extracted from patent full text and abstract with AI.

• Allows real-time, non-destructive measurement of both particle and light reflection on metal surfaces in plasma without interrupting the process
• Enables simultaneous assessment of energy and angle distribution of reflected atoms and spectral reflectivity, improving diagnostic accuracy
• Reduces downtime and contamination risk by eliminating the need for target removal for testing
• Extends usability to hazardous environments (such as radioactive, toxic, or sealed chambers) where conventional measurement is impossible or costly
• Provides data for both surface composition (atomic mass) and reflective properties, facilitating advanced material analysis
• Can improve process control and product quality in high-tech manufacturing such as semiconductor fabrication or advanced optical coating

Technical Classifications (CPCs)

Inventors & Applicants

Patent Abstract

The invention relates to a method and to a device for the in situ determination of the surface characteristics of conductive targets. The method according to the invention makes it possible to measure the energy distribution and angle distribution of the hydrogen or deuterium atoms scattered at a metal surface. From the Doppler shift of the blue- and red-shifted components of the induced Balmer lines, the spectral or specular reflectivity of the surface can be directly measured. Furthermore, the mass of the atoms at the surface of the target can be determined.