Method for In-Situ Preparation of Majorana Materials-Superconductor Hybrid Networks and a Hybrid Structure Produced by the Method

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This patent describes a method for producing high-quality hybrid structures made from Majorana materials and superconductors in a single process, performed entirely in an inert (ideally ultra-high vacuum) atmosphere. It utilizes a precise masking technique to deposit both the Majorana material and the superconducting material onto a substrate without exposure to air, ensuring clean, defect-free interfaces. The invention also includes such hybrid structures, which are foundational building blocks for topological quantum computing devices like topological qubits and Josephson junctions.

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• Manufacturing of topological qubits for quantum computers with improved error resistance
• Fabrication of complex quantum circuits, including Josephson junctions, SQUIDs, and quantum registers
• Research and development of scalable Majorana-based quantum computing architectures
• Advanced scientific studies of Majorana physics and topological superconductivity
• Production of highly integrated, scalable networks of hybrid nanostructures for quantum information applications

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• Enables in-situ fabrication ensuring pristine, uncontaminated interfaces between materials, critical for quantum device performance
• Improves reliability and scalability of quantum computing components, especially for topological qubits with intrinsic error resistance
• Reduces the number of manual and ex-situ processing steps, enhancing manufacturability and throughput
• Ensures the protection and preservation of sensitive surface states required for Majorana physics by in-situ passivation
• Allows for highly precise alignment and structuring of nano-components, enabling advanced device geometries
• Provides a scalable technique that can be extended to complex hybrid quantum devices and networks

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Patent Abstract

The invention relates to a method for producing a Majorana material superconductor hybrid structure. The superconductive material is applied onto the Majorana material using a shadow mask, wherein - a first mask (2, 3) for a structured application of the Majorana material (6) and an additional mask (shadow mask) (4, 5) for the structured growth of the superconductive material (7) are first generated on a substrate (1), said masks being aligned relative to each other, and - the Majorana material and the superconductive layers are applied without interruption in an inert atmosphere, preferably in a vacuum and particularly preferably in an ultrahigh vacuum. The produced hybrid structure comprises at least one structured Majorana material, at least one superconductive material arranged thereon, and a passivation layer. The structured Majorana material has a wire-type design with a length between 0.1 and 100 µm, a width between 10 and 200 nm, and a layer thickness between 12 and 260 nm, preferably between 15 and 50 nm. The boundary surface between the structured Majorana material and at least one superconductive material arranged thereon is advantageously free of contamination. The surface of the structured Majorana material is completely covered either by a preferably superconductive material or by a passivation layer.