Method for the in Situ Characterization of a Layer That Is to Be Deposited on a Substrate, and Sensor Arrangement

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This invention provides a method and a sensor arrangement for in situ (real-time, during the process) characterization of thin layers as they are being deposited on a substrate. By placing a capacitive sensor with two electrodes on the substrate and measuring electronic properties such as capacitance and resistance, the growth and properties of the deposited layer (including very thin organic or self-assembled monolayers) can be continuously monitored and controlled without removing the substrate from the deposition chamber.

Use CasesContent extracted from patent full text and abstract with AI.

• Monitoring and controlling the deposition of thin films in semiconductor manufacturing.
• Optimizing the production of organic electronic devices like OLEDs or organic solar cells, by real-time assessment of thin-layer growth.
• Quality control in coating processes where ultra-thin, precise coatings are required (e.g., anti-reflective coatings, biocompatible surfaces).
• In situ characterization of self-assembled monolayers (SAMs) in research or industrial environments.
• Developing sensors for process control in thin film and nanomaterial fabrication.
• Supporting research into surface functionalization for biotechnology or chemical sensors.

BenefitsContent extracted from patent full text and abstract with AI.

• Enables real-time (in situ) monitoring and characterization of thin film growth, improving process control.
• Allows precise determination of layer properties such as thickness, capacitance, permittivity, and electronic losses during deposition.
• Minimizes waste and errors by allowing immediate adjustment of process parameters based on sensor feedback.
• Applicable to a wide range of substrates (e.g., silicon, glass, oxides) and electrode materials.
• Reproducible and repeatable since the sensor arrangement can be easily regenerated and reused.
• Reduces the need for complex and time-consuming ex situ characterization techniques after deposition.
• Enhances production efficiency and product quality, especially for nano- and micro-scale coatings.

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Patent Abstract

The invention relates to a method for the in situ characterization of a layer that is to be deposited on a substrate, wherein: the layer (3) is deposited between two electrodes (2) of a capacitive sensor on a substrate (1) and at least one electronic property of the deposited layer is determined by the capacitive sensor during the growth of the layer on the substrate.