Electrostatic Biprism

Simple SummaryContent extracted from patent full text and abstract with AI.

This invention describes a novel electrostatic biprism employing a multilayer structure with a freestanding electrode, which can be fabricated using standard micro- and nano-fabrication techniques. The biprism is primarily used to split and manipulate charged particle beams, particularly electron beams, for applications such as electron holography and electron microscopy. Its design allows for more precise, mechanically stable, and miniaturized structures compared to traditional filament-based biprisms, enabling better performance and new functionalities in charged particle beam devices.

Use CasesContent extracted from patent full text and abstract with AI.

• Electron holography for imaging and phase measurements in materials science and physics research.
• Transmission electron microscopy (TEM) and scanning transmission electron microscopy (STEM) for advanced imaging and analysis.
• Generation of vortex electron beams for specialized physics experiments.
• Electron interferometry for precision measurements and fundamental physics.
• Energy filtering and phase plate applications within electron microscopes.
• Aberration correction in electron beam systems.
• Development of compact and integrated electron beam devices, such as X-biprisms for complex beam manipulation.
• Manipulation of other charged particles (ions, molecules) in spectrometers or particle optics instruments.

BenefitsContent extracted from patent full text and abstract with AI.

• Enables high-resolution and highly sensitive electron holography due to smaller, smoother, and precisely fabricated electrodes.
• Mechanically robust and stable design reduces handling difficulty and risk of failure compared to traditional wire-based biprisms.
• Freedom to design electrodes of various shapes and dimensions, including multi-biprisms and 3D arrangements.
• Improved field homogeneity around the electrode enhances interference contrast and reduces image artifacts.
• Simplifies device integration by combining electrode and holder functions into a single piece, eliminating the need for bulky or complex holders.
• Production scalability and compatibility with standard microelectronics manufacturing processes lower costs and allow batch production.
• Reduces the voltage required for beam deflection, minimizing perturbation of the electron beam and improving measurement accuracy.
• Removes the need for post-processing reference image subtraction, streamlining operation and data analysis.

Technical Classifications (CPCs)

Inventors & Applicants

Patent Abstract

The invention relates to an electrostatic biprism comprising a multilayer with a freestanding electrode, being preferably a multi-biprism, the method for preparing said electrostatic biprism and the use of said biprism within an electron beam device. The invention further relates to a microscope, an interferometer or an electron beam device comprising said electrostatic biprism.