Cleaning of Surfaces in Vacuum Apparatus by Means of Laser

Simple SummaryContent extracted from patent full text and abstract with AI.

This patent describes a method and device for cleaning metallic surfaces, particularly electrodes, inside the vacuum chamber of a coating or chemical vapor deposition (CVD) system using a laser. The cleaning is performed without opening the vacuum chamber and is accomplished by irradiating the unwanted material, such as a silicon coating, with a specific wavelength laser (typically a CO2-TEA laser), causing the unwanted layer to flake off cleanly without damaging the underlying surface. The process can be highly controlled and does not introduce harmful chemicals into the system.

Use CasesContent extracted from patent full text and abstract with AI.

• Cleaning electrodes and other metallic components inside vacuum chambers of PECVD or CVD systems used in solar cell and microelectronics manufacturing.
• Restoring the surfaces of vacuum equipment in semiconductor fabrication facilities without disassembly.
• Removing unwanted deposit layers in coating systems for improved process reliability.
• Automated maintenance procedures in industrial deposition systems involving rapid, non-invasive cleaning.

BenefitsContent extracted from patent full text and abstract with AI.

• Eliminates the need to open vacuum chambers, thereby reducing system downtime.
• Prevents contamination from toxic or corrosive cleaning chemicals and enhances safety for operators.
• Preserves the integrity of the metallic surfaces, as the laser cleaning does not damage the underlying material.
• Enables fast and targeted cleaning, increasing the efficiency and productivity of manufacturing lines.
• Reduces environmental impact by avoiding harmful process gases and minimizing waste.
• Improves the quality and performance of semiconductor devices, such as solar cells, by providing cleaner surfaces.

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Inventors & Applicants

Patent Abstract

The invention relates to a method and a device for cleaning a preferably metallic surface in a vacuum chamber of a coating system and a chemical gas-phase deposition system. A surface is cleaned in a vacuum chamber of a coating system using a laser. Firstly, the desired surface is cleaned without the need to open the vacuum chamber of the coating system. Secondly, it is possible as a matter of principle for cleaning to be carried out without the surface to be cleaned being changed.