Sensor structure for measuring arbitrary electrochemical potential in e.g. liquid, to perform electrochemical analysis, has recess interrupting electrical strip conductors on each plane as analysis room for sample to be tested

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This patent describes a sensor structure designed for the measurement of arbitrary electrochemical potentials, typically in liquids, to perform electrochemical analyses. The sensor is built with multiple planes containing parallel electrical strip conductors separated by insulation, and features a recessed area where a liquid sample can be tested. The construction allows for precise measurement using electrodes integrated onto standard substrates like CMOS or silicon.

Use CasesContent extracted from patent full text and abstract with AI.

• Real-time monitoring of water quality in environmental testing
• Biochemical analyses in healthcare diagnostics
• Industrial monitoring of chemical processes
• Research laboratories conducting electrochemical experiments
• Integration into portable electrochemical sensors for fieldwork

BenefitsContent extracted from patent full text and abstract with AI.

• Enables accurate and efficient electrochemical analysis of liquid samples
• Allows integration with common electronic substrates (CMOS/silicon), facilitating miniaturization
• Can be used for various types of electrochemical measurements due to arbitrary potential detection
• Suitable for both laboratory and portable sensor applications
• Potential for low-cost mass production due to standard manufacturing processes

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Patent Abstract

The structure has sensor planes (1a) comprising a set of parallel electrical strip conductors (2), which are spaced each other by an insulating interlayer i.e. methylsilsesquioxane, working electrode (1d) and counter electrode (1b, 1c). A recess penetrates the sensor planes and the interlayer and interrupts the electrical strip conductors on each plane as an analysis room for a sample to be tested. The strip conductors are arranged parallel or concentric to each other, and the sensor planes are arranged on a complementary metal-oxide-semiconductor (CMOS) substrate (3) or silicon substrate. An independent claim is also included for a method for manufacturing a sensor structure for electrochemical analysis.