MeV-based Ion Beam Analysis Facility

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The invention provides an advanced device for MeV-based ion beam analysis, allowing for highly precise and rapid investigation of the elemental and isotopic composition of materials. The device incorporates a unique, compact coupling system that vacuum-seals the connection between the ion beam tube and measurement chamber, enabling precise alignment and minimal spatial separations among the ion optics, detectors, sample observation systems, and sample handling modules. This integration dramatically improves measurement accuracy, sample throughput, and ease of operation, notably reducing vibration, alignment errors, and sample exchange time.

Use CasesContent extracted from patent full text and abstract with AI.

• Material research to determine the elemental and isotopic composition of samples with high spatial resolution.
• Quality control in semiconductor wafer manufacturing or thin film technology.
• Analysis of artworks and historical artifacts for compositional studies without destruction.
• Battery and advanced materials research requiring in-situ, high-precision compositional analysis during operational cycles.
• Geology and mining for analyzing ore samples for trace elements and isotopes.
• Nuclear research for studying reaction products or trace isotopes in various materials.

BenefitsContent extracted from patent full text and abstract with AI.

• Significantly enhanced spatial resolution (down to sub-micron or even nanometer scale) and measurement accuracy compared to prior systems.
• Minimized distances between key components (ion optics, detectors, samples), increasing signal quality and reducing error sources.
• Increased sample throughput and reduced downtime due to rapid, tool-free sample exchange mechanisms and in-situ positioning and observation.
• Integrated vibration damping and use of non-magnetic materials enable stable, interference-free measurements.
• Combined use of multiple ion beam analytical techniques (PIXE, NRA, RBS) enables comprehensive material analysis with very low detection limits (ppm) and high quantification accuracy (sub-%).
• Enables in-situ monitoring of active processes (e.g., charging/discharging of batteries) within the vacuum chamber during analysis.
• Highly precise, calibration-free probe manipulation achieved by piezoelectric, multi-axis manipulators with integrated position sensors.

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Patent Abstract

The invention relates to a device for an MeV-based ion beam analysis of a sample, comprising a vacuum measurement chamber with at least one detector and a camera, a vacuum system for producing a vacuum within the vacuum measurement chamber, an ion beam tube and a focusing system for focusing the ion beam, and a sample transfer system comprising a sample manipulator with a sample holder for receiving at least one sample. According to the invention, the device additionally comprises a coupling-in system for the vacuum-tight connection of the ion beam tube to the measurement chamber, which comprises an ion beam vacuum feedthrough, a mounting means for a detector, a mounting means for the camera and a mounting means for the sample transfer system.