Etching Solution and Method for Structuring a Zinc Oxide Layer and Zinc Oxide Layer

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This invention relates to an improved etching solution and method for patterning (structuring) a zinc oxide (ZnO) layer, especially for applications like thin-film solar cells. It proposes adding an iron(III) (Fe(III)) salt, such as iron(III) chloride, to a protic acid (like hydrochloric acid) in the etching solution. This accelerates the etching process, reducing processing time, while maintaining the surface structure necessary for optimal device performance. The invention also includes the structured ZnO layer produced by this process.

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• Manufacturing of thin-film solar cells with transparent, conductive front contacts based on zinc oxide.
• Production of optical or electro-optical devices such as LEDs, touch panels, or display elements requiring controlled surface structures on ZnO.
• Fabrication of flexible or rigid photovoltaic panels where rapid and controlled structuring of ZnO is desired.
• Large-scale industrial processing lines for solar module manufacturing requiring strict takt times and throughput efficiency.
• Other applications needing patterned or roughened ZnO layers (e.g., sensors, transparent electrodes, anti-reflective coatings).

BenefitsContent extracted from patent full text and abstract with AI.

• Significantly faster etching of ZnO layers without negatively impacting the critical surface features needed for efficient light scattering and conductivity.
• Separates etch time control from surface structure: processing speed can be adjusted independently from optical/electronic properties of the ZnO.
• Facilitates higher throughput and improved takt time compatibility for industrial-scale manufacturing, reducing process bottlenecks.
• Maintains or improves device performance (such as solar cell efficiency) by ensuring optimal ZnO surface morphology.
• Flexible use with a wide variety of protic acids and Fe(III) salts, offering adaptability to different industrial preferences and requirements.

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Patent Abstract

The invention relates to an etching solution for structuring a zinc oxide layer, which comprises a protic acid and at least one Fe(III) salt. It further relates to a process for structuring a zinc oxide layer, which is characterized in that the zinc oxide layer is etched by means of an etching solution comprising a protic acid and an Fe(III) salt, and also a zinc oxide layer structured thereby.