A method of preparing a substrate having a layer or pattern of metal on it
Simple SummaryContent extracted from patent full text and abstract with AI.
This invention discloses an improved method for transferring a thin metal layer or metal pattern onto a target substrate by first applying a flexible, functionalized polymer layer to the substrate. The polymer acts as a 'roughness compensating layer' to ensure intimate contact and strong adhesion of the metal, even on rough or nanostructured surfaces. The method enables precise transfer of metal features using a stamp, such as a polymeric stamp, and can be used with various metals and substrate materials.
Use CasesContent extracted from patent full text and abstract with AI.
- Fabrication of microelectronic or nanoelectronic circuits with patterned metal electrodes.
- Production of sensors and biosensors where metal patterns on insulators or semiconductors are needed.
- Manufacturing of thin-film or flexible electronic devices, such as wearable electronics and displays.
- Creation of nanostructured metal patterns for plasmonic or photonic devices.
- Micro-patterning of metals on chips for MEMS (Microelectromechanical Systems) or lab-on-a-chip applications.
- Transfer of patterned metal contacts onto delicate substrates for medical devices or implantable electronics.
BenefitsContent extracted from patent full text and abstract with AI.
- Provides strong adhesion and reliable transfer of metal layers/patterns to the target substrate by compensating for surface roughness.
- Reduces the likelihood of incomplete or inefficient transfer, leading to higher manufacturing yields and reproducibility.
- Versatile: works with a variety of metals (Au, Ag, Pt, etc.), polymers, and substrates (Si, glass, ceramics, semiconductors).
- The process can be done under mild conditions, without high pressure or temperature, reducing damage to sensitive substrates.
- Enables fabrication of highly precise and small-scale metal features, suitable for advanced nanotechnology applications.
- The method can be adapted for both planar and non-planar/structured surfaces, increasing its applicability.
Technical Classifications (CPCs)
Main Classifications
Manufacturing & Transport
Physics & Measurement
Sub Classifications
Nanotechnology
Photography & Cinematography
CPC Codes
Inventors & Applicants
Inventors
Applicants
Sony Deutschland Gmbh
Forschungszentrum Juelich Gmbh
Patent Abstract
The present invention relates to a method of preparing a substrate having a layer or pattern of metal on it, to a substrate prepared by such method and to uses thereof.
Key Information
Publication No.
EP1978406A1
Family ID
38481463
Publication Date
2008-10-08
Application No.
EP07006696A
Application Date
2007-03-30
Priority Date
2007-03-30
Granted
Yes (2/5)
Possible Cooperation
For further information please contact the transfer office.