A method of preparing a substrate having a layer or pattern of metal on it

Publication: EP1978406A1
Published: 2008-10-08
Family Size: 5
Granted: Yes (2/5)

Simple SummaryContent extracted from patent full text and abstract with AI.

This invention discloses an improved method for transferring a thin metal layer or metal pattern onto a target substrate by first applying a flexible, functionalized polymer layer to the substrate. The polymer acts as a 'roughness compensating layer' to ensure intimate contact and strong adhesion of the metal, even on rough or nanostructured surfaces. The method enables precise transfer of metal features using a stamp, such as a polymeric stamp, and can be used with various metals and substrate materials.

Use CasesContent extracted from patent full text and abstract with AI.

  • Fabrication of microelectronic or nanoelectronic circuits with patterned metal electrodes.
  • Production of sensors and biosensors where metal patterns on insulators or semiconductors are needed.
  • Manufacturing of thin-film or flexible electronic devices, such as wearable electronics and displays.
  • Creation of nanostructured metal patterns for plasmonic or photonic devices.
  • Micro-patterning of metals on chips for MEMS (Microelectromechanical Systems) or lab-on-a-chip applications.
  • Transfer of patterned metal contacts onto delicate substrates for medical devices or implantable electronics.

BenefitsContent extracted from patent full text and abstract with AI.

  • Provides strong adhesion and reliable transfer of metal layers/patterns to the target substrate by compensating for surface roughness.
  • Reduces the likelihood of incomplete or inefficient transfer, leading to higher manufacturing yields and reproducibility.
  • Versatile: works with a variety of metals (Au, Ag, Pt, etc.), polymers, and substrates (Si, glass, ceramics, semiconductors).
  • The process can be done under mild conditions, without high pressure or temperature, reducing damage to sensitive substrates.
  • Enables fabrication of highly precise and small-scale metal features, suitable for advanced nanotechnology applications.
  • The method can be adapted for both planar and non-planar/structured surfaces, increasing its applicability.

Technical Classifications (CPCs)

Main Classifications

Manufacturing & Transport

Physics & Measurement

Sub Classifications

Nanotechnology

Photography & Cinematography

CPC Codes

B82Y10/00B82Y40/00G03F7/0002

Inventors & Applicants

Applicants

Sony Deutschland Gmbh

Forschungszentrum Juelich Gmbh

Patent Abstract

The present invention relates to a method of preparing a substrate having a layer or pattern of metal on it, to a substrate prepared by such method and to uses thereof.

Key Information

Publication No.

EP1978406A1

Family ID

38481463

Publication Date

2008-10-08

Application No.

EP07006696A

Application Date

2007-03-30

Priority Date

2007-03-30

Granted

Yes (2/5)

Possible Cooperation

For further information please contact the transfer office.