Method for Optical Transfer of a Structure into a Recording Medium

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This invention describes a novel optical lithography method for transferring extremely fine structural patterns into a photosensitive recording medium. Instead of using traditional masks and high-intensity light, the approach utilizes one or more photon sources that emit very low photon flux (less than 10,000 photons per second) to locally alter the recording medium's state. This allows patterning of structures much smaller than the diffraction limit of conventional optical lithography, and avoids the necessity and technical limitations of mask-based approaches.

Use CasesContent extracted from patent full text and abstract with AI.

• Fabrication of nanoscale structures for semiconductor devices
• Prototyping micro- and nanostructures for research and development without needing custom masks
• High-precision patterning for photonic devices and nanophotonics
• Creation of ultra-fine features in microelectromechanical systems (MEMS)
• Direct-write lithography for quick turnaround in advanced manufacturing
• Production of quantum devices or single-photon sources where extreme resolution and precision are required

BenefitsContent extracted from patent full text and abstract with AI.

• Enables the creation of features much smaller than the optical diffraction limit, improving resolution beyond what conventional lithography achieves
• Eliminates the cost, time, and complexity associated with designing and producing masks
• Reduces patterning errors and artifacts caused by mask imperfections and position inaccuracies
• Allows for rapid reconfiguration or prototyping by changing photon source actuation patterns rather than hardware
• Accessible for iterative development and fabrication of novel structures due to its flexibility
• Minimizes photon-induced damage or alteration to non-targeted areas by restricting photon flux and precise source control

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Inventors & Applicants

Patent Abstract

The invention relates to a method for optical transmission of a structure into a recording medium which can be transformed locally from a first undefined state into a second defined state by irradiating with photons from a photon source. The two states of the recording medium are manifested in different physical and/or chemical properties of the recording medium. According to the invention at least one photon source having a photon flux of less than 104 photons per second is selected for the irradiation with the photons. It was recognised that with such a low photon flux especially fine structures can advantageously be transmitted into the recording medium without the irradiation having to be partially blocked by a mask. In this manner, for a given wavelength (energy) of the photons, structures can be transmitted that are considerably smaller than the width, defined by the diffraction limit, of the probability distribution for the locations at which the emitted photons are incident.