Method for Producing and Structuring a Zinc Oxide Layer and Zinc Oxide Layer

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The invention provides a method for producing and texturing zinc oxide (ZnO) layers, especially for use as transparent contact layers in solar cells. The process involves wet chemical etching of the ZnO layer using hydrofluoric acid (HF), which allows for controlled and reproducible creation of surface structures (craters) with specific sizes and densities. By adjusting the acid concentration and etching durations, the surface texture can be optimized for desired optical and electrical properties, making the ZnO layer effective for light scattering and improving solar cell efficiency.

Use CasesContent extracted from patent full text and abstract with AI.

• Production of transparent and conductive ZnO contact layers in thin-film solar cells to enhance light absorption and cell efficiency.
• Manufacture of other optoelectronic devices, such as photodetectors and display panels, where tailored surface textures are beneficial.
• Development of flexible solar modules for integration into unconventional substrates (e.g., textiles, lightweight roofing, or portable devices).
• Creation of cost-effective ZnO coatings for large-area electronic and photovoltaic devices.
• Optimization of surface structures for applications requiring controlled light management (e.g., light-trapping, anti-reflection layers).

BenefitsContent extracted from patent full text and abstract with AI.

• Enables reproducible and precise control over surface texture (crater size and density) regardless of prior ZnO deposition conditions.
• Improves light trapping and absorption in solar cells, leading to higher conversion efficiencies.
• Allows for fine-tuning of ZnO surface properties via simple changes in HF concentration and process parameters.
• Reduces dependency on costly or challenging deposition conditions, making the process suitable for large-scale, industrial production.
• Supports the formation of advanced surface structures, such as 'double structure' surfaces, which further enhance optical performance.
• Compatible with both rigid and flexible substrates, expanding potential application fields and market reach.

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Patent Abstract

The invention relates to a method for producing ZnO contact layers for solar cells. The layers are etched by means of hydrofluoric acid in order to produce a texture.