Diffraction Grating and Method for Using the Diffraction Grating

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This patent describes a specially designed diffraction grating suitable for use in monochromators for X-rays, particularly in the soft X-ray range (10 eV to 200 eV). The grating is characterized by specific geometric parameters—such as regular line spacing, a defined trapezoidal groove angle, groove depth, and width. This geometry significantly suppresses unwanted higher-order diffractions, while maintaining high efficiency for the primary (first-order) diffraction, without requiring additional complex equipment.

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• Monochromators for synchrotron radiation sources
• X-ray spectroscopy systems for physics and material sciences
• Soft X-ray microscopes and imaging systems
• Laboratory or industrial X-ray beam conditioning for accurate analysis
• Quality control and metrology systems using soft X-ray wavelengths

BenefitsContent extracted from patent full text and abstract with AI.

• Effective suppression of higher-order diffraction (reduces spectral contamination)
• High diffraction efficiency in the desired (first-order) direction, maximizing useful signal
• Simplifies the optical setup since no additional complex optics or filtering elements are needed
• Enables higher resolution and cleaner spectra for X-ray analytical instruments
• Applicable to standard substrate materials like silicon with standard coatings (e.g., gold)
• Optimized operation in the important soft X-ray energy range (10–200 eV), relevant for many advanced research and industrial applications

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Patent Abstract

The method relates to a diffraction grating and to the use thereof, as is used, for example, in monochromators for X-rays. The diffraction grating according to the invention comprises at least one substrate (S) having a surface which has grating lines, and is characterised in that the grating lines have a regular spacing and form a trapezoidal angle y in the range of from 5° to 90° in profile, comprising a line spacing (p) in the range of from 6.1 μm to 7.1 μm, an upper groove width (G) in the range of from 3.66 μm to 4.97 μm and a line depth (GD) in the range of from 55 nm to 65 nm. The ratio of the upper groove width (G) to the line spacing (p) is in the range of from 0.6 to 0.7. The diffraction grating according to the invention and the use thereof cause efficient higher-order diffraction suppression while simultaneously having good efficiency of the first-order diffraction.