Method for Producing Structured Layers with a Photonic Band Structure and Arrangement with Such a Layer

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This invention describes a computer-based method for creating structured layers with a photonic band structure by generating two-dimensional patterns using the interference of plane waves chosen for their desired periodicity and symmetry. The method allows for both periodic and aperiodic (including quasiperiodic) structures with specific control over the resulting optical properties. After processing the pattern (e.g., reducing density, identifying motif centers, and defining a 'tile'), these designs are used in fabrication techniques such as electron beam lithography or direct laser writing to produce the actual physical layers, which can be tailored for specific light interactions at the nanoscale.

Use CasesContent extracted from patent full text and abstract with AI.

• Photonic crystals used as frequency filters or dispersion compensators in optical circuits.
• Fabrication of advanced waveguides, especially for strongly curved or integrated optical paths.
• Creation of low-threshold lasers, high-performance LEDs, or absorptive-free mirrors.
• Design of highly efficient photovoltaic layers for solar cells.
• Development of high-sensitivity optical sensors based on band gap effects.
• Manufacturing of custom diffraction gratings, optical multiplexers, and demultiplexers.
• Advanced microfabrication for nanophotonic device prototyping.

BenefitsContent extracted from patent full text and abstract with AI.

• Great flexibility in generating a wide variety of periodic, aperiodic, and quasiperiodic structures with precise optical properties.
• Significantly reduced computational and fabrication programming time compared to existing methods, especially for large-area structures.
• Scalable to large surfaces while maintaining structural fidelity and desired photonic properties.
• Enables custom tailoring of photonic band gaps, including introduction of controlled defects for advanced functionalities like waveguiding or resonance.
• Compatible with multiple fabrication technologies (e-beam lithography, direct laser writing, ion beam), supporting both direct device use and mask/stamp creation for replication.
• Supports the design and manufacturing of structures with high symmetry, leading to isotropic photonic properties beneficial for broadband or omnidirectional applications.

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Patent Abstract

The invention relates to a method for producing structured layers with a photonic band structure, said layer comprising at least the steps: generating a two-dimensional pattern, reducing the density of said two-dimensional pattern by introducing a lower signal threshold, calculating the coordinates of centres of area of motifs of the two-dimensional pattern, and selecting a segment of said two-dimensional patterns as a tile. The method is characterized in that, the two-dimensional pattern is generated by the superposition of selected plane waves, said plane waves being selected on the basis of desired periodicities and symmetries in Fourier space. The lengths of the distances between the closest neighbours in the coordinates of centres of area of motifs of the two-dimensional pattern are determined by wavelengths of light, which are intended to result in interactions with the structured layer having a photonic band structure. The tile with the coordinates of the centres of area of motifs of the two-dimensional pattern is sufficient for the generation of a discrete Fourier spectrum. The structuring of a layer using a layer-structuring method is carried out using the coordinates of the centres of area of motifs of the two-dimensional pattern in the tile and the base vectors of the tile for tessellation.