Preparation of Metallic Oxynitride Thin Films Through Ammonolysis of Pulsed Laser Deposited Thin Films

Publication: EP3945141A1
Published: 2022-02-02
Family Size: 1
Granted: No

Simple SummaryContent extracted from patent full text and abstract with AI.

This invention presents a method for preparing thin films of metallic oxynitrides—specifically perovskite-type oxynitrides such as BaTaO2N—by first depositing a metallic oxide film using Pulsed Laser Deposition (PLD) and then converting it into an oxynitride through ammonolysis in ammonia gas. The process enables the production of high-purity, defect-minimized thin films that are especially useful for creating photoanodes in photoelectrochemical devices, designed for applications such as solar-driven water splitting.

Use CasesContent extracted from patent full text and abstract with AI.

  • Manufacture of efficient photoanodes for solar water splitting devices to generate hydrogen fuel from water using sunlight.
  • Production of thin-film oxynitride layers for advanced photocatalytic and optoelectronic applications.
  • Development of high-performance components for clean energy and hydrogen production systems.
  • Creation of functional coatings for photoelectrochemical cells in research and industrial settings.
  • Fabrication of electronic devices based on high-purity oxynitride thin films with tailored properties.

BenefitsContent extracted from patent full text and abstract with AI.

  • Enables precise control over composition and thickness of oxynitride thin films, leading to enhanced material performance.
  • Reduces impurities and structural defects in the resulting films compared to traditional synthesis routes, improving efficiency for target applications.
  • Scalable and adaptable process suitable for various substrate types, including conducting metals and insulators.
  • Leads to marked improvement in photocurrent and quantum efficiency for water splitting applications, promoting clean hydrogen generation.
  • Provides a general method applicable to a broad family of oxynitride materials beyond the exemplary compounds, lending versatility.

Technical Classifications (CPCs)

Main Classifications

Chemistry & Materials Science

Sub Classifications

Coating Metallic Material

Electrolytic & Electrophoretic Processes

Inorganic Chemistry

CPC Codes

C01B3/042C01G31/006C01G33/006C01G35/006C23C14/0676C23C14/28C23C14/586C25B1/04C25B9/50C25B11/054C25B11/0773C25B11/087

Inventors & Applicants

Applicants

Toyota Motor Co Ltd

Helmholtz Zentrum Berlin Fuer Mat und Energie Gmbh

Patent Abstract

The present invention provides a process for forming a metallic oxynitride comprising the steps of:(1) Pulsed Laser Deposition (PLD) of a metallic oxide; and(2) ammonolysis of the metallic oxide prepared in step (1) to form a metallic oxynitride,wherein the metallic oxide and the resulting metallic oxynitride both contain at least one of the following metals from group 2 of the Periodic Table: Ca, Sr, Ba; and at least one of the following metals from group 5 of the Periodic Table: V, Nb, Ta.The metallic oxynitrides thus produced show reduced levels of impurities and defects and can notably be used in photoelectrochemical devices for water splitting.

Key Information

Publication No.

EP3945141A1

Family ID

71899672

Publication Date

2022-02-02

Application No.

EP20189047A

Application Date

2020-07-31

Priority Date

2020-07-31

Granted

No

Possible Cooperation

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