Photoconductor and Method for Its Manufacture

Publication: DE102020213957B3
Published: 2021-09-30
Family Size: 6
Granted: Yes (2/6)

Simple SummaryContent extracted from patent full text and abstract with AI.

This patent describes a novel photoconductor (photoleiter) with a specialized multilayer structure made up of sub-layers, each containing two photoconductive semiconductor layers that are doped to different degrees. By using at least two such sub-layers, with one layer highly doped (to promote fast recombination of electron-hole pairs) and the other lightly doped (to provide high electrical resistance and suppress so-called 'dark currents'), the invention achieves optimal photoconducting properties, especially for converting optical radiation into electrical signals. The patent also covers a method for manufacturing this advanced layered photoconductor using molecular beam epitaxy and specific doping with transition metals like iron, rhodium, or ruthenium.

Use CasesContent extracted from patent full text and abstract with AI.

  • Terahertz (THz) detectors and emitters for security screening, medical imaging, or scientific research.
  • High-speed photodetectors in telecommunications and optical sensing applications.
  • Semiconductor devices that require tailored electron mobility and recombination rates, such as ultrafast switches.
  • Spectroscopy devices utilizing photoconductive antennas.
  • Optoelectronic integrated circuits for high-frequency applications.

BenefitsContent extracted from patent full text and abstract with AI.

  • Enhanced photoconductive efficiency due to layer-specific doping, leading to faster electron-hole recombination and reduced parasitic currents.
  • Ability to customize electronic and photonic properties for different applications by precisely controlling the doping profile and material composition of each layer.
  • Improved noise suppression (especially dark current) for greater signal accuracy and sensitivity.
  • Enables ultrathin device architectures (sub-10 nm layers) and dense integration.
  • Manufacturing process compatible with advanced semiconductor fabrication techniques (e.g., molecular beam epitaxy).
  • Improved device longevity and reliability through diffusion barrier layers.

Technical Classifications (CPCs)

Main Classifications

Electrical & Electronic Tech

Sub Classifications

Semiconductor & Solid-State Devices

CPC Codes

H10F30/10H10F71/1272H10F77/1243H10F77/1248H10F77/146H10F77/1468

Inventors & Applicants

Applicants

Fraunhofer Ges Forschung

Humboldt Univ zu Berlin

Patent Abstract

The invention relates inter alia to a photoconductor (10) comprising a multilayer (13) which comprises a plurality of photoconductive semiconductor layers (131-134). According to the invention, the multilayer (13) comprises at least two sublayers (130) which each comprise at least a first photoconductive semiconductor layer (131) and a second photoconductive semiconductor layer (132), wherein the first and the second photoconductive semiconductor layer (131, 132) are doped to different degrees for each of the sublayers (130).

Key Information

Publication No.

DE102020213957B3

Family ID

77659365

Publication Date

2021-09-30

Application No.

DE102020213957A

Application Date

2020-11-06

Priority Date

2020-11-06

Granted

Yes (2/6)

Possible Cooperation

For further information please contact the transfer office.