Plasma/ion-based Coating Method, and Plasma Probe

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This patent describes a plasma/ion-assisted coating method and a specialized plasma probe for monitoring and controlling the thin-film deposition process in a vacuum chamber. In this method, a vapor jet of coating material is directed onto a substrate, while an ion jet from a plasma source is simultaneously applied to enhance the growing film. During deposition, plasma probes measure key plasma properties, such as ion flow and energy density near the substrate, and these values are used to regulate the process in real time, improving the final layer's uniformity and properties.

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• Manufacturing anti-reflective and optical coatings on precision lenses and optics.
• Production of multilayer thin films for electronics and semiconductor devices.
• Surface coating of medical implants for improved biocompatibility or wear resistance.
• Deposition of protective coatings on tools and mechanical components.
• Fabrication of decorative thin films for consumer products.

BenefitsContent extracted from patent full text and abstract with AI.

• Enables precise, real-time control over thin-film deposition improving layer uniformity and reproducibility.
• Allows for targeted adjustment of key film properties, such as refractive index, by directly measuring and regulating plasma parameters.
• Reduces process drift and compensates for equipment aging or environmental changes, leading to higher quality and consistency.
• Supports complex multilayer structures and various coating materials, expanding the range of potential applications.
• Improved monitoring capabilities reduce waste and optimize production efficiency.

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Inventors & Applicants

Patent Abstract

The invention relates to a plasma/ion-based coating method in which a steam jet (17) of a coating material is generated in a vacuum chamber (14) by means of a steam source (16), said jet being directed towards a substrate (19) in order to deposit a layer (20). During a coating process, an ion jet (1) directed towards the substrate (19) is generated by means of a plasma ion source (15) in order to introduce energy into the layer (20). At least one plasma characteristic variable is determined during the coating process by means of at least one plasma probe (21, 22, 23), and the measured plasma characteristic variable or a measured value calculated from the plasma characteristic variable is used by a control device (25) in order to control the coating process. The invention further relates to a plasma probe (21, 22) which is suitable for the method.