Device and Method for Generating a Cold, Homogeneous Plasma Under Atmospheric Pressure Conditions

Publication: DE102011076806A1
Published: 2012-12-06
Family Size: 5
Granted: Yes (1/5)

Simple SummaryContent extracted from patent full text and abstract with AI.

This invention describes a plasma source device, referred to as a Plasma Intractor (PI), specifically designed to generate cold, homogeneous plasma at atmospheric pressure. The device employs at least six symmetrically arranged elongated electrodes embedded in an insulating body with a cylindrical cavity. An adjustable insulating capillary allows precise introduction of gases, vapors, or liquids into the plasma. The invention enables the excitation and control of reactive processes in flowing media, allowing for both primary and secondary plasma creation, which makes it especially stable, efficient, and suitable for a wide range of applications without overheating or significant contamination.

Use CasesContent extracted from patent full text and abstract with AI.

  • Surface modification of materials, including cleaning, activation, or coating for improved chemical resistance or adhesion.
  • Synthesis of nanoparticles, chemical compounds, and clusters using plasma-assisted processing in reactive gases or aerosols.
  • Decontamination or conversion of complex media, such as in environmental remediation or waste treatment.
  • Etching or precision material removal from various surfaces in manufacturing processes.
  • Internal modification or treatment of wires, fibers, tubes, or cables passed through the plasma zone.
  • Functionalization and plasma-enhanced deposition of thin films on temperature-sensitive substrates, such as polymers or biological materials.

BenefitsContent extracted from patent full text and abstract with AI.

  • Produces cold plasma, suitable for treating heat-sensitive materials and biological samples without damage.
  • Highly homogeneous plasma provides consistent and reproducible treatment results across a workpiece or medium.
  • Minimizes metal contamination by isolating electrodes from direct plasma exposure, reducing maintenance and cleaning.
  • Efficient energy usage due to optimized electrode arrangement and dielectric material, eliminating need for active cooling.
  • Enables precise control over reactive processes via adjustable capillary and media flow, improving process versatility.
  • Scalable design allows for arrays or matrices of devices for larger-scale or parallel processes.
  • Facilitates plasma-based chemical syntheses and surface engineering applications under safe atmospheric conditions.

Technical Classifications (CPCs)

Main Classifications

Electrical & Electronic Tech

Health, Food & Consumer Tech

Manufacturing & Transport

Sub Classifications

Electric Techniques (Other)

Medical & Vet Science

Physical & Chemical Processes

CPC Codes

A61L2/03B01J19/088H05H1/2406H05H1/2418H05H1/2443H05H1/245

Inventors & Applicants

Applicants

Leibniz Inst Fuer Plasmaforschung und Technologie E V

Patent Abstract

The invention relates to a special plasma source designated as a plasma intractor (PI) for producing a cold, homogeneous plasma under atmospheric pressure conditions, which plasma source can be used advantageously to excite and control reactive processes in flowing media. The device according to the invention is characterized in that the device comprises at least 6 elongated electrodes (2) and a molded body (1) made of insulating material, the molded body (1) being provided with an elongated cylindrical cavity (7) and with additional holes, which are guided parallel to the cavity (7) and arranged symmetrical to the axis of the cavity and equidistant to one another, and the electrodes (2) are embedded in holes of the molded body (1) and are connected to an AC high-voltage supply in such a way that the polarities of respective adjacent electrodes are opposite in each phase of the voltage period.

Key Information

Publication No.

DE102011076806A1

Family ID

46456497

Publication Date

2012-12-06

Application No.

DE102011076806A

Application Date

2011-05-31

Priority Date

2011-05-31

Granted

Yes (1/5)

Possible Cooperation

For further information please contact the transfer office.