Method for Fabricating High Aspect Ratio Gratings for Phase Contrast Imaging

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This patent describes several advanced methods for manufacturing high aspect ratio gratings (thin, tall structures with small spacing) primarily for use in phase contrast imaging systems, such as X-ray and neutron imaging. The invention focuses on improved ways to fabricate these complex structures in materials like silicon, then fill them with metal using various techniques (electroplating, atomic layer deposition, wafer bonding, and metal casting). The resulting gratings are more robust, uniform, and scalable, enhancing their suitability for high-performance imaging applications.

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• Medical X-ray imaging (e.g., mammography, full-body CT scanning) for enhanced tissue contrast.
• Industrial non-destructive testing and imaging to detect flaws in materials or assemblies.
• Neutron imaging for scientific research (e.g., materials science, engineering) where traditional absorption imaging is insufficient.
• Security screening systems requiring high-resolution imaging.
• Space applications where lightweight, large-area gratings may be needed for advanced imaging instruments.

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• Enables the fabrication of gratings with very high aspect ratios, leading to significant improvements in image quality and contrast in phase contrast imaging systems.
• Methods allow large-area and highly uniform gratings, suitable for medical and industrial applications that require precise and consistent imaging performance.
• Use of silicon and robust metal filling techniques improves structural strength and durability of the gratings, reducing the risk of collapse during fabrication and application.
• Multiple fabrication options (electroplating, atomic layer deposition, wafer bonding, metal casting) provide manufacturing flexibility and cost-effectiveness, reducing limitations of prior methods.
• Allows the use of materials with optimal absorption properties for X-rays or neutrons, enhancing imaging efficiency.
• Techniques can be applied to make gratings on curved or bent substrates, accommodating different imaging geometries and divergent beams.

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Patent Abstract

A method with several options to manufacture high aspect ratio structures is proposed. The method is based on fabrication of high aspect ratio recess structure in silicon by dry or chemical etching and then filling the high aspect ratio recess with metal by using electroplating, atomic layer deposition, wafer bonding, metal casting or combination of these techniques. The gratings can be used for x-ray or neutron imaging, as well as for space applications.