Hydrogen-Containing Polysilathianes, Process for Their Preparation and Their Use

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This patent introduces hydrogen-containing polysilathianes, which are novel sulfur-containing chemical compounds structurally similar to hydrogen-rich polysiloxanes. The patent describes a specific synthesis process to produce these compounds using hydridochlorosilane-pyridine adducts and hexamethyldisilathiane under moisture- and air-free conditions.

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• Development of new materials with unique properties for the electronics or semiconductor industry.
• Production of advanced polymer materials with enhanced chemical resistance or flexibility.
• Use as precursors for the synthesis of other organosilicon or organosulfur compounds in specialty chemicals.
• Research in sulfur-silicon chemistry, potentially leading to new catalysts or functional materials.

BenefitsContent extracted from patent full text and abstract with AI.

• Opens up new avenues to synthesize and utilize previously inaccessible sulfur-silicon compounds.
• May yield materials with improved thermal stability, chemical resistance, or other desirable properties.
• Provides a method to create chemical analogs to hydrogen-rich polysiloxanes, expanding the toolbox for materials scientists and chemists.
• Synthesized under controlled conditions, leading to higher purity and potentially better performance of end products.

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Patent Abstract

Die Erfindung betrifft wasserstoffhaltige Polysilathiane der allgemeinen Formel [SixSyHZ]n mit n > 2, x > 4, y > 4 und z > 1, das Verfahren zu deren Herstellung und deren Verwendung. Der Erfindung liegt die technische Aufgabe zugrunde, eine Synthesemöglichkeit für neuartige, zu wasserstoffreichen Polysiloxanen analoge Schwefelverbindungen zu entwickeln. Die technische Aufgabe wird dadurch gelöst, dass ein festes Hydridochlorsilan-Pyridin- bzw. Hydridochlorsilan-Pyridinderivat-Addukt mit gasförmigem Hexamethyldisilathian (Me3Si-S-SiMe3) unter Luft- und Feuchtigkeitsausschluss zu wasserstoffhaltigen Polysilathianen der allgemeinen Formel [SixSyHZ]n mit n > 2, x > 4, y > 4 und z > 1, die der allgemeinen Strukturformel [(H3SiS0,5)a(H2SiS)b(HSiS1,5)c(SiS2)d]m mit a = 0–0,5, b = 0–1, c = 0–1, d = 0–0,75 und a + b + c + d = 1 und m > 8 entsprechen, umgesetzt wird.