Device for Plasma-Assisted Generation of Highly Reactive Process Gases Based on Unsaturated H-C-N Compounds Contributing to Enrichment of the Edge Layer of Metallic Components with Increased Nitrogen and/or Carbon Content
Publication: DE102016218979A1
Published: 2018-04-19
Family Size: 1
Granted: No
Technical Classifications (CPCs)
Main Classifications
Chemistry & Materials Science
Sub Classifications
Coating Metallic Material
CPC Codes
C23C8/30
Inventors & Applicants
Applicants
Univ Freiberg Tech Bergakademie
Patent Abstract
No abstract available.
Key Information
Publication No.
DE102016218979A1
Family ID
61765338
Publication Date
2018-04-19
Application No.
DE102016218979A
Application Date
2016-09-30
Priority Date
2016-09-30
Granted
No
Possible Cooperation
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