Compounds for Treating Nitride Ceramics

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This patent describes specific organic compounds that can be used to treat, etch, polish, or clean nitride ceramics, such as silicon nitride, boron nitride, or titanium nitride. The compounds, which include well-known biocompatible molecules like lactic acid, citric acid, and glycine, are used in aqueous solutions at elevated temperatures (usually between 40°C and 90°C) to selectively remove nitride ceramic layers from substrates (e.g., silicon wafers), or to smooth and clean surfaces made of nitride ceramics. In contrast to traditional processes that utilize hazardous chemicals like hydrofluoric or phosphoric acids, these new compounds are non-toxic, environmentally friendly, and safer for workers.

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• Selective wet etching of silicon nitride or other nitride ceramics in semiconductor manufacturing (e.g., for mask removal in wafer processing).
• Polishing and surface smoothing of nitride ceramic components in industrial or medical device manufacturing.
• Post-processing and finishing of 3D-printed components made from nitride ceramics to remove sharp edges and improve comfort or fit (such as in dental or orthopedic implants).
• Safe cleaning of nitride ceramic tools and parts in various industries (metalworking, medical, electronics, etc.).
• Replacement of hazardous etchants in processes that currently use phosphoric or hydrofluoric acids to improve safety and environmental compliance.

BenefitsContent extracted from patent full text and abstract with AI.

• Non-toxic and environmentally friendly alternative to hazardous etchants like hydrofluoric acid.
• Improved workplace safety due to lower toxicity and reduced need for complex protective measures.
• Biocompatibility allows the use of residues in sensitive applications, including medical implants.
• Selective action: removes nitride ceramic layers without affecting silicon, silicon oxide, or aluminum oxide substrates, enabling precise processing.
• Simpler disposal and handling, resulting in cost savings for waste treatment and reduced regulatory burdens.
• Applicable to various nitride ceramics and suitable for multiple industries including aerospace, medical, electronics, and additive manufacturing.

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Inventors & Applicants

Patent Abstract

The invention relates to a use of a compound of general formula I, wherein A is selected from the group consisting of a hydroxy group, a thiol group and an amino group; Y is selected from the group consisting of -O-, a hydroxy group, an -NR5R6-group, an -SH-group and -O-M+, wherein R5 and R6 are independently hydrogen or a substituted or unsubstituted C1-C12-alkyl group and M+ is a cation; Z is -C(R3R4)-; R1, R2, R3 and R4 are selected independently from the group consisting of hydrogen, halogen, a hydroxy group, a carboxy group, a substituted or unsubstituted C1-C12-alkyl group, a substituted or unsubstituted carboxy-C1-C12-alkyl group, a substituted or unsubstituted C1-C12-heteroalkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted heteroaryl group, a substituted or unsubstituted alkyl-aryl group, and a substituted or unsubstituted aryl-alkyl group; and n is 0 or 1; for treating a nitride ceramic.