Method for Producing Textures, Structures or Polishes on the Surface of Silicon

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This patent describes a method for creating textures, structures, or polish finishes on the surface of silicon by using an etching process. The silicon surface is treated with an etching solution that contains at least hydrofluoric acid (HF) and bromine (Br2), and possibly water or aqueous mixtures, to achieve the desired surface modifications.

Use CasesContent extracted from patent full text and abstract with AI.

• Manufacturing textured or polished silicon wafers for solar cells to improve light absorption
• Producing finely structured silicon surfaces in the semiconductor industry for microelectronics
• Creating custom surface properties on silicon components in sensors or MEMS devices
• Enhancing the appearance or functional surfaces of silicon in optoelectronic devices

BenefitsContent extracted from patent full text and abstract with AI.

• Enables precise control over the texture and polish of silicon surfaces
• Improves efficiency and performance of silicon-based devices, such as solar cells
• Allows for more flexible and varied surface engineering compared to traditional methods
• May reduce production costs by streamlining the surface treatment process

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Inventors & Applicants

Patent Abstract

Es werden verschiedene Aspekte von Ätzlösungen und Verfahren zur Erzeugung von Texturen, Strukturen oder Polituren auf einer Oberfläche von Silizium beschrieben. Dabei kann die Siliziumoberfläche einem Ätzprozess mittels eines wasserhaltigen oder wässrigen Gemischs als Ätzlösung unterworfen werden, wobei die Ätzlösung zumindest Flusssäure (HF) und Brom (Br2) aufweist.