Method for optical characterization of transparent medium e.g. frit used in spectrometer, involves filtering focused optical radiation to separate high and low intensity components

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The patent describes a method to optically characterize transparent materials, such as frit used in spectrometers, by shining a controlled beam of light through the material and then focusing and filtering the resulting light to distinguish between undistorted and distorted light components. This helps in analyzing the quality or properties of the transparent medium.

Use CasesContent extracted from patent full text and abstract with AI.

• Quality control of transparent materials used in optical devices
• Testing the integrity and homogeneity of frits in spectrometers
• Analyzing imperfections or impurities in glass or transparent coatings
• Calibration and validation of transparent optical components during manufacturing

BenefitsContent extracted from patent full text and abstract with AI.

• Enables precise and non-destructive evaluation of transparent materials
• Improves reliability and performance of optical instruments by allowing better component selection
• Can identify defects or non-uniformities that may not be visible to the eye
• Enhances quality assurance processes in optical manufacturing

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Patent Abstract

The method involves providing coherent optical radiation (2) that has defined symmetrical intensity distribution having maximum central intensity. The spatial expansion of intensity distribution is performed with respect to characterization area. The defined intensity distribution is transmitted through medium to produce undefined distribution of intensity with distorted wavefront in characterization area. The optical radiation transmitted by distorted wavefront in characterization area is focused. The focused optical radiation is filtered to separate high and low intensity components. An independent claim is included for spectrometer.