Assembly and Method for Detecting a Measured Value Based on Electron Holography

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This patent describes a method and system for measuring physical quantities (such as voltage, current, or electric/magnetic field strengths) in very small or difficult-to-access components by using electron holography. The process involves sending a sinusoidal excitation signal to the component, then performing electron holography measurements during carefully timed windows synchronized with the excitation signal, allowing interference patterns (holograms) to be created and analyzed to extract the measurement values.

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• Measuring electric fields, voltages, or currents in micro- or nano-scale electronic components such as integrated circuits or microchips.
• Non-invasively characterizing electrical properties of tiny or hard-to-access devices where probes cannot be attached.
• Time-resolved analysis of frequency response (frequency characteristics) of microelectronic passive or active elements.
• Calibrating or verifying microelectronic devices' functional behavior in advanced semiconductor development.
• Research applications in nanoelectronics, quantum devices, and material science where spatial and temporal resolutions are crucial.

BenefitsContent extracted from patent full text and abstract with AI.

• Enables measurement of electrical or magnetic properties in extremely small or inaccessible devices without direct contact.
• Allows high temporal resolution by synchronizing measurement windows with fast excitation signals.
• Improves accuracy and minimizes disturbances by selecting optimal timing for the holography window.
• Supports advanced frequency-dependent analysis of components on a very small scale.
• Reduces complexity and increases flexibility in electronics testing for both research and quality control.
• Minimizes device damage or alteration since measurements are non-contact and minimally intrusive.

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Patent Abstract

The invention relates to a method for detecting a measured value (dϕ/dx, M). According to the invention, provision is made for a sinusoidal excitation signal (Ue) with a predetermined excitation frequency (f), with or without a superposed DC component (Uoffset), to be fed to an input of a component (100, C), for at least one electron holography measuring step to be carried out, in which an electron beam (Se) is directed on the component (100, C), said electron-beam penetrating and/or passing the component (100, C) and subsequently being superposed with a reference electron-beam (Sr), and for an electrical hologram (EHG) arising by interference of the two electron beams (Se, Sr) during a predetermined measurement window (F) to be measured and the phase image (PB) to be ascertained therefrom, and for the measured value (M) to be formed on the basis of the phase image (PB), wherein the temporal length (Tf) of the measurement window (F) of the electron holography measuring step is shorter than half the period (T) of the sinusoidal excitation signal (Ue).