Device for Carrying Out an Interferometric Measurement

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This patent describes a device designed to perform interferometric measurements, particularly suited for electron holography. The invention features a source to produce at least two coherent waves (typically electron waves), an apparatus to overlap these waves and generate an interference pattern, and a novel disturbance mechanism to locally disturb the interference pattern using a special electrode configuration at the edge of the overlap region. This setup allows for efficient and precise electrical modulation of the interference, resulting in improved measurement and analysis capabilities in electron-based interferometric systems.

Use CasesContent extracted from patent full text and abstract with AI.

• High-resolution electron holography measurements in electron microscopy.
• Precise interferometric measurement in materials science or nanotechnology research.
• Time-resolved studies of dynamic processes at the nanometer scale.
• Advanced phase imaging and wavefront shaping in electron optical systems.
• Development of new methods for exploring quantum or nanoscale phenomena.

BenefitsContent extracted from patent full text and abstract with AI.

• Enhanced efficiency and precision in disturbing and controlling electron interference patterns compared to conventional methods.
• Enables high-amplitude, low-loss application of radio or microwave signals for fast and accurate phase modulation.
• Improved flexibility and symmetry in device design, adaptable for different wave types and measurement requirements.
• Potential for integration into existing electron microscopes or holography setups, increasing their analytical capability.
• Better control over spatial and temporal characteristics of the interference pattern for advanced imaging and analytical techniques.

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Patent Abstract

Device for performing an interferometric measurement having a source for generating at least two coherent waves, an overlap apparatus for overlapping the at least two coherent waves and for generating an interference pattern, a measuring apparatus for measuring the interference pattern so as to form measured interference values, a disturbance apparatus for disturbing the interference pattern and an analyzer for analyzing the measured interference values, wherein the overlap apparatus comprises a passage region that is delimited at its edge by an edge element and is passed through by the at least two overlapping coherent waves, and comprises a beam-splitting element in the center region of the passage region.