Method and Apparatus for Selective Modification of Layer Morphology in Superconductors

Publication: DE102023210469A1
Published: 2025-04-24
Family Size: 4
Granted: Yes (1/4)

Simple SummaryContent extracted from patent full text and abstract with AI.

This invention provides a method and apparatus for locally transforming and structuring thin films of superconducting materials. The process involves depositing a thin, non-superconducting (ceramic or insulating) layer onto a substrate, then applying localized heat to selected regions of the film. These heated regions undergo a phase transition and become superconducting, forming electrically isolated superconducting structures directly within the non-superconducting matrix—without the need for traditional etching or laser ablation methods.

Use CasesContent extracted from patent full text and abstract with AI.

  • Manufacturing micro- and nano-scale superconducting circuits for quantum computers and superconducting electronics.
  • Fabrication of superconducting sensors, SQUIDs (superconducting quantum interference devices), and detectors with improved definition and reliability.
  • Production of large-area superconducting wafers or panels for power electronics, energy transmission, or magnetic resonance imaging (MRI) systems.
  • Development of scalable superconducting interconnects and patterns for telecommunications and cryoelectronic applications.
  • Integration of superconducting structures into 3D substrates or other advanced electronic components.

BenefitsContent extracted from patent full text and abstract with AI.

  • Avoids damage and degradation associated with traditional structuring methods such as chemical etching or laser ablation, thus preserving superconducting properties.
  • Reduces the complexity and number of process steps by combining patterning and phase conversion into a single local heating operation.
  • Allows for high precision and flexibility in defining superconducting patterns, adaptable to various substrate materials and geometries (including 3D surfaces).
  • Scalable for large-area and industrial applications, not limited to small chips.
  • Enables the creation of electrically isolated superconducting regions directly within thin films, improving device reliability and performance.
  • Applicable to a wide range of superconducting materials, including high-temperature, metallic, amorphous, or crystalline superconductors.

Technical Classifications (CPCs)

Main Classifications

Electrical & Electronic Tech

Sub Classifications

Semiconductor & Solid-State Devices

CPC Codes

H10N60/0576H10N60/0661

Inventors & Applicants

Applicants

Fraunhofer Ges Forschung

Technische Univ Chemnitz Koerperschaft des Oeffentlichen Rechts

Patent Abstract

The invention relates to a method for local phase transition and structuring of thin films made of superconducting materials, the method comprising the following steps: depositing a thin film (1) made of a superconducting material in a ceramic or insulating phase on a carrier substrate (2) in a deposition system (3); locally applying heat to the thin film (1), wherein regions of the thin film (1) are heated and undergo a phase transition into a superconducting phase (8) so that regions of the superconducting phase (8) form structures that are embedded in the insulating phase.

Key Information

Publication No.

DE102023210469A1

Family ID

93214839

Publication Date

2025-04-24

Application No.

DE102023210469A

Application Date

2023-10-24

Priority Date

2023-10-24

Granted

Yes (1/4)

Possible Cooperation

For further information please contact the transfer office.