Method and Apparatus for X-ray Analysis

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The invention describes a method and apparatus for advanced x-ray analysis of crystalline samples. By irradiating the sample with x-rays, recording the scattered radiation, and systematically altering the sample's stress (such as voltage, current, field, or mechanical force), the method records and analyzes differences in diffraction images (specifically Debye-Scherrer rings). This allows for detailed evaluation of how much and in what way individual crystals in the sample physically rotate or change orientation under stress, providing detailed structural insight beyond traditional x-ray methods.

Use CasesContent extracted from patent full text and abstract with AI.

• Quality control and process optimization in the manufacturing of polycrystalline solar cells (e.g., CIGS cells), by assessing crystal behavior under electrical load.
• Material science research to study stress-induced behaviors, phase transformations, or mechanical properties in nanomaterials and crystalline substances.
• Non-destructive testing in electronics or battery research to monitor material changes during operation.
• Development of improved piezoelectric, magnetic, or semiconductor materials by analyzing microscopic responses to stimuli.
• Optimizing thin-film coatings and functional materials where crystal orientation critically affects performance.

BenefitsContent extracted from patent full text and abstract with AI.

• Enables quantitative, non-destructive measurement of crystal rotation and reorientation within a sample under applied stress.
• Provides higher sensitivity to microstructural changes than conventional x-ray diffraction methods.
• Allows differentiation between changes due to lattice constant (strain) and actual physical rotation, enhancing interpretability.
• Facilitates better material and device selection in industries where microscopic orientation affects efficiency, such as solar cell manufacturing.
• Supports quality control and rapid process optimization by providing real-time, detailed feedback on crystal behavior.
• Applicable to a wide range of stress parameters: electric, magnetic, electromagnetic, and mechanical.

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Patent Abstract

A method for evaluating signals at an x-ray analysis device suitable for analysing a sample of crystalline substances, characterized by the following method steps: irradiating the sample with x-ray radiation, recording the scattered x-ray radiation using a detector, repeating the recording with a modified stress parameter for the sample, subtracting at least one pair of recordings at different stress parameters, analysing at least one difference image in respect of whether one or more reflections within the recorded Debye-Scherrer rings have a greater change in intensity than the surrounding reflections of the Debye-Scherrer rings, performing a quantitative analysis in relation to the extent of which crystals contained in the sample are rotated.