Device and Method for Coating Channels of a Sample by Means of Gas Phase Deposition

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This patent describes a device and method for efficiently coating the inner surfaces of channels (such as those in micro- or nanostructures) using gas phase deposition techniques like atomic layer deposition (ALD) or chemical vapor deposition (CVD). The invention uses an alternating supply of at least two different gaseous precursors, applied via controlled pressure gradients, to ensure uniform coating even inside long, narrow channels. Additionally, a secondary outlet removes unreacted precursors and reaction products, preventing blockages and ensuring efficient process cycles.

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• Coating the internal surfaces of microfluidic device channels for lab-on-a-chip applications.
• Manufacturing advanced filters or membranes with functionalized or protective inner surfaces.
• Fabrication of sensors where high-aspect-ratio structure coating is essential (e.g., nanowire or nanotube sensors).
• Creating catalytic or protective coatings inside pipes or porous structures used in chemical processing or fuel cells.
• Enhancing medical devices such as stents by applying biocompatible coatings to their inner channels.

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• Enables reliable and uniform coating of channels with extremely high aspect ratios, including those at nanometer scales.
• Improves process efficiency and yield compared to traditional diffusion-based deposition methods, reducing production time.
• Reduces risk of clogging and defects by actively removing unreacted material and reaction byproducts from both ends of the channels.
• Offers precise control over process parameters such as pressure gradient and flow regime, ensuring repeatability and scalability.
• Allows processing of a wider range of structures and device types, expanding application possibilities in advanced manufacturing.

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Patent Abstract

The invention relates to a device and a method for coating channels by means of vapor deposition, wherein gaseous precursors are supplied to the channels via at least one supply line connected to first channel ends of the channels and are discharged from the channels together with reaction products via a first discharge line connected to second channel ends lying opposite the first channel ends. The invention is characterized in that at least two different precursors are supplied to the first channel end in an alternating manner via the at least one supply line; while supplying the precursors, a precursor flow is conducted along a first flow direction from the supply line to the first discharge line through the channels by generating an adjustable pressure gradient; and non-reacted precursors and reaction products are discharged via a second discharge line connected to the first channel end.