Method for Manufacturing a Scatter Radiation Collimator, Scatter Radiation Collimator, and X-Ray Device with Scatter Radiation Collimator
Simple SummaryContent extracted from patent full text and abstract with AI.
This invention describes a method for manufacturing a scattered beam collimator, primarily used in X-ray devices. The core technique involves using a lithographic process to build partitions out of photoresist material that includes an X-ray absorbing substance. These partitions create channels that allow only unscattered (direct) X-rays to pass, which improves imaging quality by blocking scattered radiation.
Use CasesContent extracted from patent full text and abstract with AI.
- Medical X-ray imaging devices (such as CT scanners or digital X-ray machines)
- Security screening systems (e.g., at airports)
- Non-destructive industrial testing using X-ray inspection
- Scientific X-ray imaging instruments for materials analysis
BenefitsContent extracted from patent full text and abstract with AI.
- Improves image clarity and accuracy in X-ray systems by reducing the impact of scattered radiation
- Enables precise and customizable fabrication of collimators via lithographic techniques
- Potentially enhances patient safety by reducing unnecessary exposure to scattered X-rays
- Supports miniaturization and high-resolution device design due to advanced manufacturing process
Technical Classifications (CPCs)
Main Classifications
Health, Food & Consumer Tech
Physics & Measurement
Sub Classifications
Medical & Vet Science
Nuclear Physics & Engineering
Photography & Cinematography
CPC Codes
Inventors & Applicants
Applicants
Univ Friedrich Alexander Er
Siemens Healthcare Gmbh
Patent Abstract
The invention relates to a method for producing a scattered beam collimator starting from a lower side and extending in a build-up direction as far as an upper side, and having a large number of X-rayabsorbing partitions, and in which pass-through channels for unscattered X-ray radiation are embodied between the partitions. A lithographic process is used, by which the partitions of the scatteredbeam collimator are formed from a photoresist into which an X-ray absorbing material is mixed.
Key Information
Publication No.
DE102019208888A1
Family ID
73653956
Publication Date
2020-12-24
Application No.
DE102019208888A
Application Date
2019-06-19
Priority Date
2019-06-19
Granted
Yes (2/5)
Possible Cooperation
For further information please contact the transfer office.