Producing transparent conductive layer, by subjecting substrate e.g. glass to plasma treatment, applying dispersion from transparent conductive oxide nanoparticles on substrate, and partially removing solvent/dispersant from obtained layer

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This patent describes a method for producing a transparent and conductive layer on substrates like glass or plastic. The process involves plasma treating the substrate, coating it with a dispersion of transparent conductive oxide (such as indium-tin oxide nanoparticles), gently removing some of the solvent by annealing, and finally irradiating the coated layer with a carbon dioxide laser. Various deposition techniques such as inkjet printing, spin coating, and spraying can be used to apply the nanoparticle dispersion.

Use CasesContent extracted from patent full text and abstract with AI.

• Manufacturing touch screens for electronic devices such as smartphones and tablets
• Producing transparent electrodes for OLED displays and flexible electronics
• Creating conductive coatings for solar cells and photovoltaic panels
• Developing anti-static or electromagnetic shielding coatings on transparent surfaces
• Fabricating smart windows that can modulate light or heat transmission

BenefitsContent extracted from patent full text and abstract with AI.

• Enables production of transparent, conductive layers on various substrates, including plastic and glass
• Offers compatibility with multiple coating methods, allowing for flexibility in manufacturing processes
• Provides improved layer quality and conductivity through post-processing with CO2 laser irradiation
• Allows for low-temperature processing, making it suitable for heat-sensitive substrates
• Potentially reduces production costs and increases scalability for large-area electronics

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Patent Abstract

The method comprises subjecting a substrate such as glass or plastic to a plasma treatment, applying a dispersion from transparent conductive oxide (TCO) nanoparticles on the substrate, partially removing solvent or dispersant from the obtained layer by annealing at 20-200[deg] C for a time period of 1 second to 60 minutes, and subsequently irradiating the obtained layer with a carbon dioxide (CO 2)-laser energy. The dispersion contains indium-tin oxide nanoparticles and is applied on the substrate by inkjet-printings, flexographic printings, pad-printings, spin coating and spraying. The method comprises subjecting a substrate such as glass or plastic to a plasma treatment, applying a dispersion from transparent conductive oxide (TCO) nanoparticles on the substrate, partially removing solvent or dispersant from the obtained layer by annealing at 20-200[deg] C for a time period of 1 second to 60 minutes, and subsequently irradiating the obtained layer with a carbon dioxide (CO 2)-laser energy. The dispersion contains indium-tin oxide nanoparticles and is applied on the substrate by inkjet-printings, flexographic printings, pad-printings, spin coating, spraying, dipping, knife-coating, offset printings, screen printings, thermo-transfer printings, gravure printings, flooding, aerosol jet deposition process or pouring. The obtained layer is irradiated with the CO 2-laser energy with a wavelength of 10.6 mu m and/or with an average output of 1 W to 3 kW and/or a scan line between the next adjacent lines of 0.01-2 mm described by scanning. During scanning, an intersection plane of the focused laser beam is moved with the plane of the obtained layer on the intersection plane with a speed of 50-150000 mm/s. An independent claim is included for a transparent conductive layer.