Device and Method for Coating a Substrate by CVD

Publication: DE102008044028A1
Published: 2010-08-12
Family Size: 10
Granted: Yes (4/10)

Simple SummaryContent extracted from patent full text and abstract with AI.

This patent describes a device and method for coating substrates using Chemical Vapor Deposition (CVD), focusing on the deposition of materials like diamond or silicon. The invention uses an array of heating conductors (wires) kept taut by individual weights, and introduces a special arrangement where the force vector of each weight is closely aligned (≤45°, preferably 5–35°, ideally 10–20°) with the longitudinal axis of the heating conductor. This configuration, along with an electrical sliding contact at the second electrode, significantly increases the lifespan of the heating wires, allows the use of thinner wires, reduces maintenance, and enables multiple consecutive coating cycles without replacing the wires.

Use CasesContent extracted from patent full text and abstract with AI.

  • Industrial production of diamond-coated tools and components via CVD.
  • Manufacturing of silicon layers for semiconductors or solar cells requiring high-purity, consistent coatings.
  • CVD coating systems where frequent heater replacement is costly or problematic (e.g., batch processing in the electronics, cutting tools, or optics industries).
  • Production lines needing high-throughput and minimal downtime for heater maintenance.
  • Any advanced materials research or lab setups requiring reliable, repeatable CVD processes with minimal intervention.

BenefitsContent extracted from patent full text and abstract with AI.

  • Greatly extends the operating life of heating conductors, reducing downtime and material waste.
  • Enables the use of thinner heating wires, which require less electrical power and reduce unwanted heat radiation, improving energy efficiency.
  • Allows dozens of coating cycles (up to 50) before heater replacement is needed, lowering routine maintenance requirements.
  • Maintains consistent and reproducible substrate-to-heater distances, ensuring uniform coating thicknesses and higher product quality.
  • Customizable configuration for various substrate sizes and shapes, increasing system versatility.
  • Reduces total cost of ownership for CVD systems thanks to minimized replacement and labor needs.
  • Improves coating reliability and process stability through controlled temperature and tension of heating conductors.

Technical Classifications (CPCs)

Main Classifications

Chemistry & Materials Science

Electrical & Electronic Tech

Sub Classifications

Coating Metallic Material

Crystal Growth

Electric Elements

CPC Codes

C23C16/24C23C16/27C23C16/271C23C16/44C30B29/04C30B29/06H01L21/67115

Inventors & Applicants

Applicants

Cemecon Ag

Diaccon Gmbh

Univ Friedrich Alexander Er

Patent Abstract

The invention relates to a device for coating a substrate using CVD, in particular for coating with diamond or silicon, wherein a heat conductor array composed of a plurality of elongated heat conductors (2) is provided in a housing (9), said heat conductors extending between a first (1) and a second electrode (6), wherein the heat conductors are held individually tensioned by a weight (4) attached to one end thereof. To increase the life of the heat conductors (2), the invention proposes that the weight (4) or the heat conductor (2) be guided at the second electrode (6), forming an electrical loop contact, in such a way that a vector of the weight force (G) produced by the weight (4) makes an angle (a) of no more than 45° with a direction of the longitudinal extension of the heat conductor (2).

Key Information

Publication No.

DE102008044028A1

Family ID

41611313

Publication Date

2010-08-12

Application No.

DE102008044028A

Application Date

2008-11-24

Priority Date

2008-11-24

Granted

Yes (4/10)

Possible Cooperation

For further information please contact the transfer office.